The influence of gamma irradiation on photoluminescence and nonlinear optical
response of silica films activated by semiconductor nanocrystals
Olga V. Goncharova (

), V. S. Kalinov, A. P. Voitovich
Institute of Molecular and Atomic Physics, National Academy of Sciences of
Belarus, F. Scaryna Prospect 70, 220072 Minsk, Belarus.
In the present report the fabrication techniques involving the post-growth
gamma-irradiation for the preparation of low-threshold saturable absorbers
based on silica films activated by semiconductor nanometer-sized crystals
(nanocrystals - NCs) of technologically controllable size and space ordering
are reported.
The modification of the optical spectra in the NC-composed films is determined
by room-temperature comparative investigations of the photoluminescence (PL)
and nonlinear optical (NLO) parameters of the samples of high-pure and
semiconductor (ZnSe, CdS and CdSe) NC-composed fused-silica films before and
after irradiation for various exposure conditions.
An emission band centered at 432 nm (~2.87eV), excited at 352-360 nm and
exhibiting a strong silica nanoparticle dispersion dependence, was detected
for unirradiated samples. The observation of the modification of the violet
luminescence band (432 nm) and the appearance of the red luminescence band at
wavelengths of 620-650 nm for gamma-irradiated samples are reported. The
parameters of optical nonlinearities detected in silicon dioxide films
composed by various semiconductor NCs are also analyzed before and after
gamma-irradiation of different dozes. The results are discussed in the frames
of structural models reported in the literature.