The development of new techniques for the fabrication of nanoscale devices has recently received increasing interest with the approach of the limits of conventional optical lithography. In this paper, we explore a new technique for the construction of three-dimensional nanoscale objects for potential application in the fabrication of MEMS devices with sub-diffraction limit resolution. Multiphoton excitation and scanning near-field optics (NSOM) are used to construct three-dimensional nanoscale features. The highly localized fields created using NSOM provide the capacity to fabricate three-dimensional features with characteristic dimensions much below the exposure wavelength. The wavelength at which two-photon excitation occurs provides the potential to incorporate diverse chemical functionality into polymeric nanostructures, including UV-absorbing materials. The results of fundamental experiments have verified the feasibility of the fabrication of three-dimensional nanoscale structures with two-photon absorbing initiators as well as the incorporation of unique chemical functionality into polymeric microstructures.