Nanoelectronics is the challenging field required the development of new methods and technologies for real implementation. Non-thermal plasma, because of its non-thermal nature, can provide extra capabilities for the design and creation of nanoscale objects, structures and films. The work is dedicated to the application of non-equilibrium plasmas and other physical methods like particle beams or UV radiation to the initiation, stimulation and control of the processes of the thin films and nanostructures growth. Both original results and detail overview are presented. The presentation is covering as experimental as theoretical results in this field. Several lines of plasma application are under consideration and in particular plasma and UV-O3 approach to the control of the chemical composition of the surface sites; ion plasma catalysis of new phase formation processes and oxides film growth through the oxidation of PVD deposited metal films; ions beams control of the phase composition of growing and deposited films; theoretical and experimental investigation of non-equilibrium plasmas assisted processes of nanoclusters and nanoparticles growth. Special attention is devoted to the analysis of the new opportunities, which plasma technique could bring for the nanoobjects fabrication.