14:00 -
14:30 |
Julian D. Gale1,
Emilio Artacho2,
Alberto Garcia3,
Javier Junquera4,
Pablo Ordejon5,
Daniel Sanchez-Portal6, and
Jose M. Soler7
1Department of Chemistry, Imperial College of Science,
Technology and Medicine, South Kensington, SW7 2AY, UK
2Department of Earth Sciences, University of Cambridge,
Downing St., Cambridge, CB2 3EQ, UK
3Departamento de Fisica de la Materia Condensada, Universidad
del Pais Vasco, Apt. 644, 48080 Bilbao, Spain.
4Institut de Physique, Batiment B5, Universite de Liege,
B-4000 Sart-Tilman, Belgium.
5Institut de Cienccia de Materials de Barcelona, CSIC,
Campus de la UAB, Bellaterra, 08193 Barcelona, Spain.
6Dep. de Fisica de Materiales and DIPC, Facultad de
Quimica, UPV/EHU, Apt. 1072, 20080 Donistia, Spain.
7Dep. de Fisica de la Materia Condensada, C-III, Universidad
Autonoma de Madrid, E-28049 Madrid, Spain.
Ab initio calculation at the nanoscale
[GALE]
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14:30 -
15:00 |
David Graves,
David Humbird, and Yoshie Kimura
University of California at Berkeley,
Chemical Engineering,
Gilman 201,
UC Berkeley,
Berkeley CA 94720, USA
Atomistic Simulations of Plasma-Surface Chemistry and Comparison to Experiment
[GRAVES]
|
15:00 -
15:30 |
Coffee Break
|
15:30 -
16:00 |
Marius Orlowski
DDL Laboratories, Motorola Inc.,
3501 Ed Bluestein Blvd, Austin, Texas 78721, USA
Microscopic Derivation of Zero-Flux Boundary Condition in 1-D Random Walk in
Presence of a Reflecting Barrier
[ORLOWSKI]
|
16:00 -
16:15 |
Natalia Kirova1,2 ,
M.-N. Bussac1
1 CPHT, Ecole Polytechnique, 91128 Palaiseau, France.
2 POMA, Université Angers, 49045 Angers, France.
Field induced surface polarons in molecular crystals.
[KIROVA1]
|
16:15 -
16:30 |
Leonardo R.C. Fonseca1, Anatoli Korkin1,
Xiaodong Zhang2, Alexander A. Demkov2, Andrey Knizhnik3
 1Motorola Inc.,
Semiconductor Product Sector,
2200 W. Broadway,
Mesa, Arizona, United States, 85202
 2Motorola Inc.,
Physical Sciences Research Laboratory,
7700 S. River Parkway,
Tempe, Arizona, United States, 85284
3Kintech Technologies Ltd,
Kurtchatov Square 1,
Moscow, Russia, 123182
Atomistic calculation of leakage current through ultra-thin metal-oxide
barriers
[FONSECA]
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16:30 -
17:00 |
Coffee Break
|
17:00 -
17:20 |
Clemens J. Foerst1,2,
Peter E. Bloechl1,
and Karlheinz Schwarz2
1Institute for Theoretical Physics, Clausthal University
of Technology, Austria.
2Institute for Materials Chemistry,
Vienna University of Technology, Vienna, Austria.
Heteroepitaxial growth of high-k gate oxides on silicon: insights from
first-principles calculations
[FOERST]
|
17:20 -
17:40 |
Andrey Knizhnik1, Alexander
Bagatur'yants1, Boris Potapkin1 and Anatoli Korkin2
1Kinetic Technologies, Kurchatov Sq. 1, 123182, Moscow,
Russia.
2Semiconductor Products Sector, Motorola Inc., 2200 W. Broadway Road, Mesa, AZ 85202, USA
Investigation of Zirconia Film Growth on the (001) Silicon Surface Using the
Integrated kMC-DR Approach
[KNIZHNIK]
|
17:40 -
18:00 |
Jacob L. Gavartin, A. S. Foster,
V. B. Sulimov, F. Lopez Gejo, and A. L. Shluger
Department of Physics and Astronomy, University College London,
Gower Street, WC1E 6BT, London, UK
Oxygen and hydrogen defects in zirconia and hafnia: density functional
molecular dynamics approach.
[GAVARTIN]
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